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A PROCEDURE FOR MEASURING P-CHANNEL MOSFET NEGATIVE BIAS TEMPERATURE INSTABILITIES
Published by | Publication Date | Number of Pages |
JEDEC | 11/01/2004 | 19 |
JEDEC JESD90 – A PROCEDURE FOR MEASURING P-CHANNEL MOSFET NEGATIVE BIAS TEMPERATURE INSTABILITIES
This document describes an accelerated stress and test methodology for measuring device parameter changes of a single p-channel MOSFET after Negative Bias Temperature Instability (NBTI) stress at dc bias conditions. This document gives a procedure to investigate NBTI stress in a symmetric voltage condition with the channel inverted (VGS < 0) and no channel conduction (VDS = 0).There can be NBTI degradation during channel conduction (VGS < 0, VDS < 0), however, this document does not cover this phenomena.
Product Details
- Published:
- 11/01/2004
- Number of Pages:
- 19
- File Size:
- 1 file , 94 KB
- Note:
- This product is unavailable in Russia, Ukraine, Belarus
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